About the service

The Electron Spectroscopy Unit contains an ultrahigh vacuum (UHV) multifaceted system for surface analyses at pressures below 10-9 torr. A variety of techniques are available:

  1. X-ray photoelectron spectroscopy (XPS) – a quantitative analytical probe providing the surface (outer ~10 nm) composition, elemental oxidation states, as well as high-resolution information on the arrangement of the surface atoms along the vertical axis. Lateral mapping of surface elemental concentrations can be obtained at 3 µm resolution.
  2. Ultraviolet photoelectron spectroscopy (UPS) – a technique for measuring at improved energy resolution the valence-electron energy bands and the secondary electron emission (SEE) spectrum. UPS can also be used to derive the sample work-function.
  3. Scanning Auger microscopy (SAM) – a technique complementary to XPS, providing the surface chemical analysis at improved lateral resolution, down to 200 nm in our setup.
  4. Ion scattering spectroscopy (ISS) with an Ar+ or He+ source beam, offering complementary chemical information at improved surface sensitivity.
  5. Chemically resolved electrical measurements (CREM) – a novel XPS-based technique that was developed in our lab to provide nm-scale electrical information from selected surface and sub-surface domains. This includes (1) I-V curves of inner layers; (2) sub-surface field and work-function mapping; (3) domain-specific photovoltages; (4) atomic-scale electrical characteristics in organic molecular layers; (5) hot-electron transport characteristics; (6) novel pyroelectricity measurements; (7) a soft dielectric breakdown inspection method; and more.


Hagai Cohen
Hagai Cohen
Tel. 08-934-3422, 052-840-9389