Click on picture for enlarged view Dr. Diana Mahalu

Submicron lithography is performed via the Electron Beam writing process. The E-Beam system is used to produce structures as small in size as 15 nm. An extremely well-focused electron beam is used to scan an electron sensitive film. After the exposure process the shape of the desirable pattern is exposed. This shape is then reproduced onto the semiconducting material in order to define the desired device structure.