Click on picture for enlarged view Mr.Michael Schneiderman Mrs. Olga Raslin

Processing systems include Plasma Etching and Plasma Deposition systems to etch vertical walls with minimum damage to lower lying layers, and to deposit insulators such as SiO2 and Si2N3. Ultra high vacuum evaporation systems are used to deposit metal films for Ohmic contacts and various metal gates. Annealing systems are used to activate the Ohmic contacts and allow current transport through the devices