Chemical-mechanical planarization (CMP)

Instrument Specification

Company: Logitech LTD

Model: PM6 Precision Lapping and Polishing System

Description: Chemical mechanical polishing system for lapping (thinning) and polishing diamond plates and wafers up to 4”. 

Features:

  • Process up to 100mm/4″ wafers.
  • Up to 100rpm plate, speed facilitating faster-lapping rates.
  • Driven jig roller arm with a linear sweep.

Main capabilities:

  • Thinning diamond plates down to 50µm
  • Polishing diamond to surface roughness down to Ra ~ 0.5Å (@ area of 2x2µm2)

 

Location

Schmidt Hall

Staff Contacts

Training information

Consult with Eran Mishuk

Links & Documents