לוח שנה משולב

I will present a superspace formulation of the local RG equation, in which the constraints of holomorphy and R-symmetry are manifest. I will discuss several properties of supersymmetric RG flows which can be derived using this methodology.

For more than three decades, the number of transistors on a chip has grown exponentially, doubling on the average of every 18 months. With each new technology generation, the role of lithography has increased in importance not only because of the requirements for smaller feature sizes and tighter overlay, but also because of the increasing costs of lithography tools. Optical projection lithography and its extensions, e.g., water immersion, are expected to remain the lithographic technologies until at least 2020. Extreme ultraviolet lithography (EUVL) extends optical lithography to a higher resolution and provides a larger depth of focus because it utilizes a shorter imaging wavelength: 13.5 nm versus 193-248 nm. In this talk, brief history of the development of the 13.5 nm light sources is addressed along with the current state of the EUV technology. In addition to that, examples of the extreme ultraviolet radiation applications beyond the lithography and for advancing the nano-technology will be given.